AKA “Tosylamide Formaldehyde Resin, Nail Polish Resin”
Ingredient
Ingredient Facts
Tosylamide/formaldehyde resin
AKA: Tosylamide Formaldehyde Resin, Nail Polish Resin
Ingredient · Film Forming · EWG: 4
Plant-Derived Synthetic
Occlusive
Not Clean
Benzenesulfonamide, 4-methyl-, polymer with formaldehyde
CAS #
25035-71-6
See origin →
Functions
Film Forming
Creates a physical seal on skin to lock moisture in and keep irritants out. The "slugging" ingredient — barrier protection.
Plasticiser
Anti-Inflammatory
Moisturizing
Fights Acne
Creates protective layer
Adds flexibility
Traditional Use
Developed in the early 20th century as a synthetic film-forming agent. First used in nail polishes in the 1920s to create a hard, glossy finish and improve wear resistance.